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"Methodology for Standard Cell Compliance and Detailed Placement for Triple ..."

Bei Yu et al. (2015)

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DOI: 10.1109/TCAD.2015.2401571

access: closed

type: Journal Article

metadata version: 2020-09-24

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  - https://dblp.org/rec/journals/tcad/YuXGL0AP15
Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, Yibo Lin, Zhuo Li, Charles J. Alpert, David Z. Pan:
Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34(5): 726-739 (2015)

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