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Eduard Cartier

Eduard A. Cartier

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Conference and Workshop Papers

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2019
[c5]
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  dblp key:
  - conf/irps/CartierKGGFBKKA19
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  - https://dblp.org/rec/conf/irps/CartierKGGFBKKA19
Eduard A. Cartier, Wanki Kim, Nanbo Gong, Tayfun Gokmen, Martin M. Frank, Douglas M. Bishop, Youngseok Kim, Seyoung Kim, Takashi Ando, Ernest Y. Wu, Praneet Adusumilli, John Rozen, Paul M. Solomon, Wilfried Haensch, Matthew J. BrightSky, Abu Sebastian, Geoffrey W. Burr, Vijay Narayanan:
Reliability Challenges with Materials for Analog Computing. IRPS 2019: 1-10
2018
[c4]
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  dblp key:
  - conf/irps/CartierFARN18
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Eduard Cartier, Martin M. Frank, Takashi Ando, John Rozen, Vijay Narayanan:
PBTI in InGaAs MOS capacitors with Al2O3/HfO2/TiN gate stacks: Interface-state generation. IRPS 2018: 5
2017
[c3]
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  - conf/essderc/CartierMLAFRJLC17
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  - https://dblp.org/rec/conf/essderc/CartierMLAFRJLC17
Eduard Cartier, Atreya Majumdar, K.-T. Lee, Takashi Ando, Martin M. Frank, John Rozen, Keith A. Jenkins, C. Liang, C.-W. Cheng, John Bruley, M. Hopstaken, Pranita Kerber, J.-B. Yau, X. Sun, R. T. Mo, Chun-Chen Yeh, Effendi Leobandung, Vijay Narayanan:
Electron mobility in thin In0.53Ga0.47As channel. ESSDERC 2017: 292-295
2015
[c2]
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  dblp key:
  - conf/irps/SrinivasanFSKES15
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  - https://dblp.org/rec/conf/irps/SrinivasanFSKES15
P. Srinivasan, J. Fronheiser, S. Siddiqui, A. Kerber, L. F. Edge, Richard G. Southwick, Eduard Cartier:
NBTI in Si0.5Ge0.5 RMG gate stacks - Effect of high-k nitridation. IRPS 2015: 2
2013
[c1]
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  dblp key:
  - conf/vlsi-dat/LinderCKW13
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  - https://dblp.org/rec/conf/vlsi-dat/LinderCKW13
Barry P. Linder, Eduard Cartier, S. Krishnan, Ernest Y. Wu:
Improving and optimizing reliability in future technologies with high-κ dielectrics. VLSI-DAT 2013: 1-4

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