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"NBTI in Si0.5Ge0.5 RMG gate stacks - Effect of high-k nitridation."

P. Srinivasan et al. (2015)

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DOI: 10.1109/IRPS.2015.7112695

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-08

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P. Srinivasan, J. Fronheiser, S. Siddiqui, A. Kerber, L. F. Edge, Richard G. Southwick, Eduard Cartier:
NBTI in Si0.5Ge0.5 RMG gate stacks - Effect of high-k nitridation. IRPS 2015: 2

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