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Andreas Kerber
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2010 – 2019
- 2018
- [j3]Andreas Kerber, Tanya Nigam:
Bias temperature instability in scaled CMOS technologies: A circuit perspective. Microelectron. Reliab. 81: 31-40 (2018) - [c5]Wen Liu, Andreas Kerber, Fernando Guarin, Claude Ortolland:
Cap layer and multi-work-function tuning impact on TDDB/BTI in SOI FinFET devices. IRPS 2018: 2 - 2017
- [j2]Andreas Kerber
:
Assessment of sense measurement duration on BTI degradation in MG/HK CMOS technologies using a novel stacked transistor test structure. Microelectron. Reliab. 73: 153-157 (2017) - [c4]Tanya Nigam, Andreas Kerber, Tian Shen, Rakesh Ranjan, Linjun Cao:
Material and device innovation impact on reliability for scaled CMOS technologies. ESSDERC 2017: 134-139 - 2016
- [j1]Andreas Kerber:
Device to circuit reliability correlations for metal gate/high-k transistors in scaled CMOS technologies. Microelectron. Reliab. 64: 145-151 (2016) - 2015
- [c3]Tanya Nigam, Andreas Kerber:
Enabling Scaling of Advanced CMOS Technologies: A Reliability Perspective. ISVLSI 2015: 199 - 2014
- [c2]S. Balasubramanian, Vivek Joshi, Torsten Klick, Randy W. Mann, Joseph Versaggi, Akhilesh Gautam, C. Weintraub, G. Kurz, G. Krause, Andreas Kerber, Biju Parameshwaran, Tanya Nigam:
HTOL SRAM Vmin shift considerations in scaled HKMG technologies. CICC 2014: 1-4 - [c1]Tanya Nigam, Andreas Kerber:
Reliability modeling of HK MG technologies. CICC 2014: 1-8
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