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"Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout ..."

Xiaoqing Xu et al. (2015)

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DOI: 10.1109/TCAD.2015.2399439

access: closed

type: Journal Article

metadata version: 2020-09-24

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Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Z. Pan:
Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34(5): 699-712 (2015)

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