Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"A systematic study of gate dielectric TDDB in FinFET technology."

Hyunjin Kim et al. (2018)

> Home

Details and statistics

DOI: 10.1109/IRPS.2018.8353577

access: closed

type: Conference or Workshop Paper

metadata version: 2019-01-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/KimJSKJCPSP18
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/KimJSKJCPSP18
Hyunjin Kim, Minjung Jin, Hyun-Chul Sagong, Jinju Kim, Ukjin Jung, Minhyuck Choi, Junekyun Park, Sangchul Shin, Sangwoo Pae:
A systematic study of gate dielectric TDDB in FinFET technology. IRPS 2018: 4

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.