"Impact of Al2O3 position on performances and reliability in high-k metal ..."

Marc Aoulaiche et al. (2013)

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DOI: 10.1109/ESSDERC.2013.6818851

access: closed

type: Conference or Workshop Paper

metadata version: 2023-12-08

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Marc Aoulaiche, Eddy Simoen, Romain Ritzenthaler, Tom Schram, Hiroaki Arimura, Moonju Cho, Thomas Kauerauf, Guido Groeseneken, Naoto Horiguchi, Aaron Thean, Antonio Federico, Felice Crupi, Alessio Spessot, Christian Caillat, Pierre Fazan, Hyuokju Na, Y. Son, K. B. Noh:
Impact of Al2O3 position on performances and reliability in high-k metal gated DRAM periphery transistors. ESSDERC 2013: 190-193

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