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Journal Articles
- 2013
[j10]Young-Seon Jeong, Byungwhan Kim, Young-Don Ko:
Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing. Expert Syst. Appl. 40(14): 5688-5693 (2013)- 2012
- [j9]Byungwhan Kim, Daehyun Kim:
Use of neural network to in situ conditioning of semiconductor plasma processing equipment. Appl. Soft Comput. 12(2): 826-831 (2012) - [j8]Dongil Han, Jongho Choi, Byungwhan Kim, Jae Il Cho:
Design and VLSI implementation of a high-performance face detection engine. Comput. Electr. Eng. 38(5): 1222-1239 (2012) - 2011
- [j7]Byungwhan Kim, Sanghee Kwon:
Wavelet-coupled backpropagation neural network as a chamber leak detector of plasma processing equipment. Expert Syst. Appl. 38(5): 6275-6280 (2011) - [j6]Su Jin Lee, Byungwhan Kim, Sung Wook Baik
:
Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition. Expert Syst. Appl. 38(9): 11437-11441 (2011) - 2010
- [j5]Byungwhan Kim, Sanghee Kwon, Donghwan Kim:
Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm. Expert Syst. Appl. 37(1): 182-186 (2010) - 2009
- [j4]Byungwhan Kim, Hwajune Lee, Donghwan Kim:
Modeling of Thin Film Process Data Using a Genetic Algorithm-Optimized Initial Weight of Backpropagation Neural Network. Appl. Artif. Intell. 23(2): 168-178 (2009) - [j3]Byungwhan Kim, Hee Ju Kwon, Seongjin Choi:
Use of adaptive network fuzzy inference system to predict plasma charging damage on electrical MOSFET properties. Expert Syst. Appl. 36(3): 6570-6573 (2009) - [j2]Byungwhan Kim, Jeong Kim, Seongjin Choi:
Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment. Expert Syst. Appl. 36(8): 11347-11351 (2009) - 2002
- [j1]Byungwhan Kim, Jang Hyun Park, Beom-Soo Kim:
Fuzzy Logic Model of Langmuir Probe Discharge Data. Comput. Chem. 26(6): 573-581 (2002)
Conference and Workshop Papers
- 2007
- [c6]Byungwhan Kim, Seongjin Choi:
Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process. ISNN (1) 2007: 602-608 - 2006
- [c5]Byungwhan Kim, Dukwoo Lee, Seung Soo Han:
Prediction of Plasma Enhanced Deposition Process Using GA-Optimized GRNN. ISNN (2) 2006: 1020-1027 - [c4]Byungwhan Kim, Donghwan Kim, Seung Soo Han:
Prediction of Radio Frequency Impedance Matching in Plasma Equipment Using Neural Network. ISNN (2) 2006: 1028-1035 - [c3]Byungwhan Kim, Sooyoun Kim, Sang Jeen Hong:
Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network. ISNN (2) 2006: 1036-1042 - [c2]Byungwhan Kim, Wooram Ko, Seung Soo Han:
Neural Network Recognition of Scanning Electron Microscope Image for Plasma Diagnosis. PRICAI 2006: 350-357 - [c1]Byungwhan Kim, Jae Young Park, Donghwan Kim, Seung Soo Han:
Diagnosis Model of Radio Frequency Impedance Matching in Plasma Equipment by Using Neural Network and Wavelets. PRICAI 2006: 995-999
Coauthor Index
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