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"E-Beam Lithography Stencil Planning and Optimization With Overlapped ..."

Kun Yuan, Bei Yu, David Z. Pan (2012)

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DOI: 10.1109/TCAD.2011.2179041

access: closed

type: Journal Article

metadata version: 2020-09-24

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Kun Yuan, Bei Yu, David Z. Pan:
E-Beam Lithography Stencil Planning and Optimization With Overlapped Characters. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 31(2): 167-179 (2012)

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