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"Layout Decomposition and Legalization for Double-Patterning Technology."

Rani S. Ghaida et al. (2013)

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DOI: 10.1109/TCAD.2012.2232710

access: closed

type: Journal Article

metadata version: 2021-10-28

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Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta:
Layout Decomposition and Legalization for Double-Patterning Technology. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(2): 202-215 (2013)

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