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"A direct measurement of electromigration induced drift velocity in Cu dual ..."

M. Y. Yan et al. (2006)

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DOI: 10.1016/J.MICROREL.2005.11.004

access: closed

type: Journal Article

metadata version: 2020-02-22

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M. Y. Yan, King-Ning Tu, A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy:
A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects. Microelectron. Reliab. 46(8): 1392-1395 (2006)

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