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"Study of hafnium oxide deposited using Dense Plasma Focus machine for film ..."

A. Srivastava et al. (2011)

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DOI: 10.1016/J.MICROREL.2010.12.002

access: closed

type: Journal Article

metadata version: 2020-02-22

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A. Srivastava, R. K. Nahar, Chandan Kumar Sarkar, W. P. Singh, Y. Malhotra:
Study of hafnium oxide deposited using Dense Plasma Focus machine for film structure and electrical properties as a MOS device. Microelectron. Reliab. 51(4): 751-755 (2011)

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