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"An SEM/STM based nanoprobing and TEM study of breakdown locations in ..."

Kalya Shubhakar et al. (2015)

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DOI: 10.1016/J.MICROREL.2015.07.027

access: closed

type: Journal Article

metadata version: 2023-03-21

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Kalya Shubhakar, Michel Bosman, O. A. Neucheva, Y. C. Loke, Nagarajan Raghavan, R. Thamankar, Alok Ranjan, Sean J. O'Shea, Kin Leong Pey:
An SEM/STM based nanoprobing and TEM study of breakdown locations in HfO₂/SiO_x dielectric stacks for failure analysis. Microelectron. Reliab. 55(9-10): 1450-1455 (2015)

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