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"Investigation of the shift of hot spot in lateral diffused LDMOS under ESD ..."

Qinsong Qian et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.05.010

access: closed

type: Journal Article

metadata version: 2022-07-12

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Qinsong Qian, Weifeng Sun, Jing Zhu, Longxing Shi:
Investigation of the shift of hot spot in lateral diffused LDMOS under ESD conditions. Microelectron. Reliab. 50(12): 1935-1941 (2010)

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