"Electromigration failure distributions of dual damascene Cu /low - k ..."

A. S. Oates, Shou-Chung Lee (2006)

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DOI: 10.1016/J.MICROREL.2006.07.038

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type: Journal Article

metadata version: 2020-02-22

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A. S. Oates, Shou-Chung Lee:
Electromigration failure distributions of dual damascene Cu /low - k interconnects. Microelectron. Reliab. 46(9-11): 1581-1586 (2006)

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