Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Analysis of deep submicron VLSI technological risks: A new qualification ..."

F. Molière et al. (2009)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2009.07.001

access: closed

type: Journal Article

metadata version: 2023-09-30

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/MoliereFPB09
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/MoliereFPB09
F. Molière, B. Foucher, Philippe Perdu, Alain Bravaix:
Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics. Microelectron. Reliab. 49(9-11): 1381-1385 (2009)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.