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"Flexible metal-insulator-metal capacitor using plasma enhanced binary ..."
Jagan Singh Meena et al. (2010)
- Jagan Singh Meena, Min-Ching Chu, Jitendra N. Tiwari, Hsin-Chiang You, Chung-Hsin Wu, Fu-Hsiang Ko:
Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer. Microelectron. Reliab. 50(5): 652-656 (2010)
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