"Process variation dependence of total ionizing dose effects in bulk nFinFETs."

Bo Li et al. (2018)

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DOI: 10.1016/J.MICROREL.2018.07.020

access: closed

type: Journal Article

metadata version: 2021-09-23

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Bo Li, Yunbo Huang, Ling Yang, Qingzhu Zhang, Zhongshan Zheng, Binhong Li, Huiping Zhu, Jianhui Bu, Huaxiang Yin, Jiajun Luo, Zhengsheng Han, Haibin Wang:
Process variation dependence of total ionizing dose effects in bulk nFinFETs. Microelectron. Reliab. 88-90: 946-951 (2018)

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