"Adhesion of NCF to oxidized Si wafers after oxygen plasma treatment."

Min-Seok Jang et al. (2017)

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DOI: 10.1016/J.MICROREL.2017.09.001

access: closed

type: Journal Article

metadata version: 2022-10-02

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Min-Seok Jang, Sung Woo Ma, Jongsoo Song, Myungmo Sung, Young-Ho Kim:
Adhesion of NCF to oxidized Si wafers after oxygen plasma treatment. Microelectron. Reliab. 78: 220-226 (2017)

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