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"Significantly improving sub-90 nm CMOSFET performances with notch-gate ..."

Chia-Wei Hsu et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.08.002

access: closed

type: Journal Article

metadata version: 2020-02-22

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Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chien-Ting Lin:
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer. Microelectron. Reliab. 48(11-12): 1791-1794 (2008)

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