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"Total ionizing dose effects in shallow trench isolation oxides."

Federico Faccio et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.04.004

access: closed

type: Journal Article

metadata version: 2022-10-02

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  - https://dblp.org/rec/journals/mr/FaccioBCFGMS08
Federico Faccio, Hugh J. Barnaby, Xiao J. Chen, Daniel M. Fleetwood, Laura Gonella, Michael L. McLain, Ronald D. Schrimpf:
Total ionizing dose effects in shallow trench isolation oxides. Microelectron. Reliab. 48(7): 1000-1007 (2008)

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