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"Energy monitoring of high dose ion implantation in semiconductors via ..."

Christoph Eichenseer, Gerhard Pöppel, Thomas Mikolajick (2015)

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DOI: 10.1016/J.MICROREL.2015.06.001

access: closed

type: Journal Article

metadata version: 2020-02-22

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Christoph Eichenseer, Gerhard Pöppel, Thomas Mikolajick:
Energy monitoring of high dose ion implantation in semiconductors via photocurrent measurement. Microelectron. Reliab. 55(9-10): 1369-1372 (2015)

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