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"Electromigration-induced stress in a confined bamboo interconnect with ..."
X. Dong et al. (2010)
- X. Dong, P. Zhu, Zhonghua Li, Jun Sun, J. D. Boyd:
Electromigration-induced stress in a confined bamboo interconnect with randomly distributed grain sizes. Microelectron. Reliab. 50(3): 391-397 (2010)
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