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"Development and application of the Oxide Stress Separation technique for ..."

Adam Dobri et al. (2017)

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DOI: 10.1016/J.MICROREL.2016.12.006

access: closed

type: Journal Article

metadata version: 2020-02-22

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Adam Dobri, Simon Jeannot, Fausto Piazza, Carine Jahan, Jean Coignus, Luca Perniola, Francis Balestra:
Development and application of the Oxide Stress Separation technique for the measurement of ONO leakage currents at low electric fields in 40 nm floating gate embedded-flash memory. Microelectron. Reliab. 69: 47-51 (2017)

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