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"Degradation induced by TID radiation and hot-carrier stress in 130-nm ..."

Lihua Dai et al. (2017)

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DOI: 10.1016/J.MICROREL.2017.05.021

access: closed

type: Journal Article

metadata version: 2020-02-22

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Lihua Dai, Xiaonian Liu, Mengying Zhang, Leqing Zhang, Zhiyuan Hu, Dawei Bi, Zhengxuan Zhang, Shichang Zou:
Degradation induced by TID radiation and hot-carrier stress in 130-nm short channel PDSOI NMOSFETs. Microelectron. Reliab. 74: 74-80 (2017)

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