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"Study of copper drift during TDDB of intermetal dielectrics by using fully ..."

Kristof Croes et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.07.047

access: closed

type: Journal Article

metadata version: 2022-12-02

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Kristof Croes, G. Cannatá, L. Zhao, Zsolt Tökei:
Study of copper drift during TDDB of intermetal dielectrics by using fully passivated MOS capacitors as test vehicle. Microelectron. Reliab. 48(8-9): 1384-1387 (2008)

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