"Next generation of Deep Trench Isolation for Smart Power technologies with ..."

R. Charavel et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.07.117

access: closed

type: Journal Article

metadata version: 2020-02-22

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R. Charavel, Jaume Roig, S. Mouhoubi, P. Gassot, Filip Bauwens, Piet Vanmeerbeek, B. Desoete, Peter Moens, Eddy De Backer:
Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices. Microelectron. Reliab. 50(9-11): 1758-1762 (2010)

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