"Effect of deposition methods on dielectric breakdown strength of PECVD ..."

H. Zhou et al. (2004)

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DOI: 10.1016/J.MEJO.2004.03.004

access: closed

type: Journal Article

metadata version: 2020-02-22

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H. Zhou, F. G. Shi, B. Zhao, J. Yota:
Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films. Microelectron. J. 35(7): 571-576 (2004)

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