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"Investigation of Zr-N thin films for use as diffusion barrier in Cu ..."

Ying Wang et al. (2007)

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DOI: 10.1016/J.MEJO.2007.06.001

access: closed

type: Journal Article

metadata version: 2021-01-21

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Ying Wang, Fei Cao, Minghui Ding, Dawei Yang:
Investigation of Zr-N thin films for use as diffusion barrier in Cu metallization. Microelectron. J. 38(8-9): 910-914 (2007)

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