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"Placement of scattering bars in binary and attenuated phase shift mask for ..."

Sohan Singh Mehta et al. (2004)

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DOI: 10.1016/J.MEJO.2003.10.008

access: closed

type: Journal Article

metadata version: 2020-02-22

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Sohan Singh Mehta, Navab Singh, Moitreyee Mukherjee-Roy, Rakesh Kumar:
Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning. Microelectron. J. 35(7): 621-626 (2004)

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