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"Low-pressure H₂/N₂ annealing on indium tin oxide film."

Shang-Chou Chang (2007)

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DOI: 10.1016/J.MEJO.2007.09.022

access: closed

type: Journal Article

metadata version: 2020-02-22

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Shang-Chou Chang:
Low-pressure H₂/N₂ annealing on indium tin oxide film. Microelectron. J. 38(12): 1220-1225 (2007)

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