"Micromachined high-Q inductors in a 0.18-μm copper interconnect low-k ..."

Hasnain Lakdawala et al. (2002)

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DOI: 10.1109/4.987092

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type: Journal Article

metadata version: 2022-04-09

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Hasnain Lakdawala, Xu Zhu, Hao Luo, Suresh Santhanam, L. Richard Carley, Gary K. Fedder:
Micromachined high-Q inductors in a 0.18-μm copper interconnect low-k dielectric CMOS process. IEEE J. Solid State Circuits 37(3): 394-403 (2002)

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