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"Electrical and Structural Properties of Metal-Oxide-Semiconductor (MOS) ..."

Hoon-Ki Lee et al. (2011)

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DOI: 10.1587/TRANSELE.E94.C.846

access: closed

type: Journal Article

metadata version: 2020-04-11

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  persistent URL:
  - https://dblp.org/rec/journals/ieicet/LeeCSYC11
Hoon-Ki Lee, S. V. Jagadeesh Chandra, Kyu-Hwan Shim, Jong-Won Yoon, Chel-Jong Choi:
Electrical and Structural Properties of Metal-Oxide-Semiconductor (MOS) Devices with Pt/Ta₂O₅ Gate Stacks. IEICE Trans. Electron. 94-C(5): 846-849 (2011)

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