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"Impact of Hf content on positive bias temperature instability reliability ..."

H. W. Chen, Chuan-Hsi Liu (2010)

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DOI: 10.1016/J.MICROREL.2010.01.012

access: closed

type: Journal Article

metadata version: 2022-08-29

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H. W. Chen, Chuan-Hsi Liu:
Impact of Hf content on positive bias temperature instability reliability of HfSiON gate dielectrics. Microelectron. Reliab. 50(5): 614-617 (2010)

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