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"Evaluation of Device Parameters of HfO2/SiO2/Si Gate Dielectric Stack for ..."

A. Madan et al. (2005)

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DOI: 10.1109/ICVD.2005.94

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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  dblp key:
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  - https://dblp.org/rec/conf/vlsid/MadanBGS05
A. Madan, S. C. Bose, P. J. George, Chandra Shekhar:
Evaluation of Device Parameters of HfO2/SiO2/Si Gate Dielectric Stack for MOSFETs. VLSI Design 2005: 386-391

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