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"Weibull analysis of the kinetics of resistive switches based on tantalum ..."

Yoshifumi Nishi et al. (2013)

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DOI: 10.1109/ESSDERC.2013.6818847

access: closed

type: Conference or Workshop Paper

metadata version: 2020-12-10

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Yoshifumi Nishi, Sebastian Schmelzer, Ulrich Böttger, Rainer Waser:
Weibull analysis of the kinetics of resistive switches based on tantalum oxide thin films. ESSDERC 2013: 174-177

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