"Analysis and optimization of SRAM robustness for double patterning ..."

Vivek Joshi et al. (2010)

> Home

Details and statistics

DOI: 10.1109/ICCAD.2010.5654105

access: closed

type: Conference or Workshop Paper

metadata version: 2024-06-04

- view
  authority control:
- export record
  dblp key:
  - conf/iccad/JoshiABS10
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/iccad/JoshiABS10
Vivek Joshi, Kanak Agarwal, David T. Blaauw, Dennis Sylvester:
Analysis and optimization of SRAM robustness for double patterning lithography. ICCAD 2010: 25-31

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.