"Effect of ions presence in the SiOCH inter metal dielectric structure."

Benjamin Rebuffat et al. (2013)

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DOI: 10.1109/ESSDERC.2013.6818858

access: closed

type: Conference or Workshop Paper

metadata version: 2021-05-05

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  dblp key:
  - conf/essderc/RebuffatMMOMPLL13
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  - https://dblp.org/rec/conf/essderc/RebuffatMMOMPLL13
Benjamin Rebuffat, Vincenzo Della Marca, Pascal Masson, Jean-Luc Ogier, Marc Mantelli, Olivier Paulet, Laurent Lopez, Romain Laffont:
Effect of ions presence in the SiOCH inter metal dielectric structure. ESSDERC 2013: 218-221

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