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"Analyzing the impact of Double Patterning Lithography on SRAM variability ..."

Vivek Joshi et al. (2010)

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DOI: 10.1109/CICC.2010.5617623

access: closed

type: Conference or Workshop Paper

metadata version: 2018-07-31

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Vivek Joshi, Michael Wieckowski, Gregory K. Chen, David T. Blaauw, Dennis Sylvester:
Analyzing the impact of Double Patterning Lithography on SRAM variability in 45nm CMOS. CICC 2010: 1-4

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