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F. Höhnsdorf

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2001
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Detlef Weber, F. Höhnsdorf, A. Hausmann, A. Klipp, Z. Stavreva, J. Herrmann, L. Bauch, M. Junack, H. Neef, M. Nichterwitz, S. Finsterbusch:
Impact of substituting SiO₂ ILD by low k materials into AlCu RIE metallization. Microelectron. Reliab. 41(7): 1081-1083 (2001)

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