Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Impact of substituting SiO2 ILD by low k materials into AlCu ..."

Detlef Weber et al. (2001)

> Home

Details and statistics

DOI: 10.1016/S0026-2714(01)00077-4

access: closed

type: Journal Article

metadata version: 2023-08-10

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/WeberHHKSHBJNNF01
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/WeberHHKSHBJNNF01
Detlef Weber, F. Höhnsdorf, A. Hausmann, A. Klipp, Z. Stavreva, J. Herrmann, L. Bauch, M. Junack, H. Neef, M. Nichterwitz, S. Finsterbusch:
Impact of substituting SiO₂ ILD by low k materials into AlCu RIE metallization. Microelectron. Reliab. 41(7): 1081-1083 (2001)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.