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"A 40-nm 16-Mb Contact-Programming Mask ROM Using Dual Trench Isolation ..."
Yong Ye et al. (2016)
- Yong Ye, Yong Kang, Chao Zhang, Yipeng Chan, Hanming Wu, Shiuhwuu Lee, Zhitang Song, Bomy Chen:
A 40-nm 16-Mb Contact-Programming Mask ROM Using Dual Trench Isolation Diode Bitcell. IEEE Trans. Very Large Scale Integr. Syst. 24(4): 1333-1341 (2016)
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