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"Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography."
Xu Ma et al. (2019)
- Xu Ma
, Zhiqiang Wang, Xuanbo Chen, Yanqiu Li
, Gonzalo R. Arce:
Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography. IEEE Trans. Computational Imaging 5(1): 120-135 (2019)
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