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"Process Modeling for Photoresist Development and Design of DLR/sd ..."

Yoshihiko Hirai et al. (1987)

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DOI: 10.1109/TCAD.1987.1270285

access: closed

type: Journal Article

metadata version: 2020-09-24

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  - https://dblp.org/rec/journals/tcad/HiraiSETM87
Yoshihiko Hirai, Masaru Sasago, Masayuki Endo, Kiichiro Tsuji, Yojiro Mano:
Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 6(3): 403-409 (1987)

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