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"Monte Carlo simulation of silicon amorphization during ion implantation."

Walter Bohmayr et al. (1998)

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DOI: 10.1109/43.736563

access: closed

type: Journal Article

metadata version: 2020-09-24

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  - https://dblp.org/rec/journals/tcad/BohmayrBLRS98
Walter Bohmayr, Alexander Burenkov, Jürgen Lorenz, Heiner Ryssel, Siegfried Selberherr:
Monte Carlo simulation of silicon amorphization during ion implantation. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 17(12): 1236-1243 (1998)

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