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"Characteristics of silicon nitride after O2 plasma surface ..."

Li-Te Yin et al. (2001)

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DOI: 10.1109/10.914797

access: closed

type: Journal Article

metadata version: 2021-07-28

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Li-Te Yin, Jung-Chuan Chou, Wen-Yaw Chung, Tai-Ping Sun, Shen-Ken Hsiung:
Characteristics of silicon nitride after O₂ plasma surface treatment for pH-ISFET applications. IEEE Trans. Biomed. Eng. 48(3): 340-344 (2001)

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