"Optimum design of a large area, flexure based XYθ mask alignment ..."

Changkyu Lee et al. (2019)

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DOI: 10.1016/J.RCIM.2019.02.005

access: closed

type: Journal Article

metadata version: 2021-08-06

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Changkyu Lee, Jae Woong Lee, Sang Gil Ryu, Je Hoon Oh:
Optimum design of a large area, flexure based XYθ mask alignment stage for a 12-inch wafer using grey relation analysis. Robotics Comput. Integr. Manuf. 58: 109-119 (2019)

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