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"Investigation of interface, shallow and deep oxide traps under NBTI stress ..."

Hakim Tahi et al. (2014)

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DOI: 10.1016/J.MICROREL.2014.01.010

access: closed

type: Journal Article

metadata version: 2023-09-30

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Hakim Tahi, Boualem Djezzar, Abdelmadjid Benabdelmoumene, Amel Chenouf, Mohamed Goudjil:
Investigation of interface, shallow and deep oxide traps under NBTI stress using charge pumping technique. Microelectron. Reliab. 54(5): 882-888 (2014)

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