"Nitrogen implantations for rapid thermal oxinitride layers."

A. Stadler et al. (2001)

> Home

Details and statistics

DOI: 10.1016/S0026-2714(01)00051-8

access: closed

type: Journal Article

metadata version: 2023-09-18

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/StadlerGBDPHBE01
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/StadlerGBDPHBE01
A. Stadler, I. Genchev, A. Bergmaier, G. Dollinger, Vesselinka Petrova-Koch, Walter Hansch, H. Baumgärtner, I. Eisele:
Nitrogen implantations for rapid thermal oxinitride layers. Microelectron. Reliab. 41(7): 977-980 (2001)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.