Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"NBTI reliability of Ni FUSI/HfSiON gates: Effect of silicide phase."

A. Shickova et al. (2007)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2007.01.046

access: closed

type: Journal Article

metadata version: 2023-10-31

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/ShickovaKVAHMGK07
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/ShickovaKVAHMGK07
A. Shickova, Ben Kaczer, Anabela Veloso, Marc Aoulaiche, M. Houssa, Herman E. Maes, Guido Groeseneken, J. A. Kittl:
NBTI reliability of Ni FUSI/HfSiON gates: Effect of silicide phase. Microelectron. Reliab. 47(4-5): 505-507 (2007)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.